
Chemical Etching, Laser Evolved Etching Process & Electroforming Processes
Below is an overview of the full range of manufacturing technologies available at Precision Micro. Please click on the process name or use the left hand navigation menu for a detailed explanation of each of these processes.
Photo Etching | LEEP | LEEF | Wire EDM | |
| Materials | Almost all metals | Almost all metals | Predominantly Nickel | All metals providing they are conductive |
| Material thickness | 0.025mm - 1.5mm | 0.01mm - 1.5mm | Multilayer>0.5mm | 0.01mm -250mm |
| Component / sheet size | Max 600mm x 1500mm | Max 800mm x 600mm | Max 590mm x 740mm | Max 254mm x 220mm (250mm high limit) |
| Tolerances | ±0.025mm range | ±0.010mm range | ±0.005mm range | ±0.010mm range |
| Volume / batch size | One to millions | One to millions | One to 1000's | One to 1000's |
| Minimum Feature | 0.050mm | 0.025mm | 0.01mm | 0.200mm |


